200 wph
with throughput upgrade
Product
Canon FPA-6300ES6a KrF scanner
High-productivity KrF scanner for advanced chip processing.
1.6X
faster than previous models
≤ 90 nm
resolution
≤ 5 nm
overlay accuracy
Highly sophisticated mass production
Significantly reduce wafer handling, alignment and exposure processing times with advanced technologies. The Canon FPA-6300ES6a is designed for high volume production of devices such as microprocessors and colour filters.
Save time
Reticle and Wafer Stages improve productivity, alignment and wafer handling time.
Pinpoint accuracy
Overlay accuracy of less than 5 nm thanks to advanced stage-control technologies.
Scalability
Options and upgrades support next-generation semiconductor manufacturing.
Product Specifications
Resolution
≤ 90 nm
Wafer size
300 mm
Productivity
≥ 200 wafers per hour *
Exposure area
26 mm x 33mm
Overlay accuracy
≤ 5 nm, with overlay upgrade
Numerical Aperture (NA)
0.50 ~ 0.86
* - 300mm wfer, 98 shots, with Options
Find out how the Canon FPA-6300ES6a KrF scanner can transform your semiconductor manufacturing
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